The Dutch government today published an updated license requirement regarding the export of immersion DUV semiconductor equipment. ASML believes this requirement will harmonize the approach for issuing export licenses.

As a result of the updated license requirements, and in line with US Export Administration Regulation 734.4.(a).(3), ASML will need to apply for export licenses with the Dutch government rather than the US government for shipments of its TWINSCAN NXT:1970i and 1980i DUV immersion lithography systems. The Dutch export license requirement is already in place for the TWINSCAN NXT:2000i and subsequent DUV immersion systems. Sales of ASML's EUV systems are also subject to license requirements.

The updated license requirement published by the Dutch government comes into effect from September 7, 2024.

Since this is a technical change, this announcement is not expected to have any impact on our financial outlook for 2024 or for our longer-term scenarios as communicated during our Investor Day in November 2022.