Recently, Applied Materials launched a new electron beam measuring device specifically designed to accurately measure the key dimensions of semiconductor devices using EUV and the emerging high-NA EUV lithography technology, which can effectively reduce the cost of the photolithography process. This device is known as the VeritySEM10 Critical Dimensions Scanning Electron Microscope (CD-SEM) measurement system.
应用材料推出新设备 有望降低EUV光刻成本
Applied Materials launches new equipment expected to reduce EUV lithography costs
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