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康达新材(002669.SZ):PAG主要用于在化学放大型光刻胶中

Kangda New Materials (002669.SZ): PAG is mainly used in chemically amplified photoresists.

Gelonghui Finance ·  Jun 12 20:28

Kangda New Materials (002669.SZ) stated on the investor interaction platform on June 12 that its subsidiary, Caijing Optoelectronics, currently has the production technology and process of the core raw material photo initiator (PAC) of the positive photoresist of TFT-LCD panel and the photo initiator (PAG) of the semiconductor integrated circuit photoresist, multiple products have undergone performance testing at target customers. The company plans to invest in the construction of the "Semiconductor Photoresist Core Material Photo Initiator Technology Research and Industrialization Project", and plans to complete the product trial and mass production process technology research through the development of this project, and ultimately form the industrial production capacity of photo initiators. At present, the installation of the trial equipment for the relevant projects of Caijing Optoelectronics has entered the final stage. PAC is mainly used in the photoresist of linear phenolic resin system, such as g/i line photoresist of FPD and IC; PAG is mainly used in chemical amplification photoresist, including some IC photoresist. The end application fields are semiconductors (IC) and flat panel displays (FPD).

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