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半導体フォトレジスト用感光性ポリマー「リソマックス」の生産能力増強~九州事業所・福岡地区にArFフォトレジスト用リソマックスおよびEUVフォトレジスト用リソマックスの各量産設備を新設~NEW

Increase in production capacity of photoresist-sensitive polymer 'LISOMAX' for semiconductors: Installation of new mass production equipment for ArF photoresist-sensitive LISOMAX and EUV photoresist-sensitive LISOMAX at Kyushu plant/Fukuoka area.

Mitsubishi Chemical Group ·  Jun 11 23:00

The Mitsubishi Chemical Group (hereinafter “our group”) has decided to establish new mass production facilities for ArF (argon fluoride) photoresists and Lysomax for EUV (extreme ultraviolet) photoresists at the Mitsubishi Chemical Kyushu Office/Fukuoka area (Kitakyushu-shi, Fukuoka-ken) in order to increase production capacity of the photosensitive polymer “Lithomax” for photoresists.
Photosensitive polymers for photoresists are resins that are the main components of photoresists used in photolithography processes to transfer semiconductor circuit patterns to wafers. Since our group's Lithomax has low metal content and impurities, it can meet the high quality requirements associated with miniaturization of semiconductor circuits, so it has been adopted by many photoresist manufacturers. Above all, Japanese companies have an overwhelming share of ArF photoresists and EUV photoresists, which are essential for further miniaturization, and market growth is expected in the future, so demand for Lithomax, which is a raw material, is also expected to expand steadily.
The Group currently produces Risomax in the Kanto Office/Tsurumi area (Yokohama City, Kanagawa Prefecture), but in order to respond to expanding demand and strengthen the supply chain, we have decided to establish new mass production facilities at the Kyushu Office/Fukuoka area. As a result, the production capacity of Lithomax for ArF photoresists will more than double, and mass production of Lithomax for EUV photoresists will begin for the first time.
The Group has a lineup of various materials and services for semiconductor manufacturing processes, and will continue to contribute to the semiconductor industry by providing high quality and stable supply.

  • Location: Mitsubishi Chemical Corporation Kyushu Office/Fukuoka Area
         (1-1 Kurosaki Joishi, Yahatanishi-ku, Kitakyushu-shi, Fukuoka)
  • Product Photosensitive Polymer for Photoresists “Lithomax”
  • Operation period (planned) Resomax for ArF photoresist 2025/10

Lithomax for EUV photoresists September 2025

  
The role of Lysomax photoresists


Lithomax product site
https://www.m-chemical.co.jp/products/departments/mcc/semicon/product/1200368_7244.html
Mitsubishi Chemical Group's semiconductor-related products and services introduction site
https://www.mcgc.com/news_release/pdf/01686/01939.pdf
The information described in the news release is current as of the date of publication. Please note that the current information may differ from the information as of the announcement date.

The translation is provided by third-party software.


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