① Shen Bo, senior vice president of Dutch lithography giant Asma Global and president of China, said in an exclusive interview during the Expo that he is very optimistic about next year's business in China. ② The importance of the photomask version to the lithography process is not less than that of lithography machines and photoresists, and the prosperity of the industry is expected to continue to be strong.
Shen Bo, senior vice president of Dutch lithography giant Asma Global and president of China, said in an exclusive interview during the Expo that Asma China's business is growing rapidly this year. It is expected that China will account for more than 20% of Asma's global revenue throughout the year, and he is also very optimistic about next year's business in China. Shen Bo said, “We will be recruiting more than 200 people in China in 2023. In 2024, we expect that business development will continue to bring a lot of demand, and the expansion of our team should continue to be relatively large.”
As one of the upstream core materials in the semiconductor industry chain, the photomask version is not less important to the lithography process than lithography machines and photoresist. It is an indispensable and important component in the semiconductor and integrated circuit chip manufacturing process, and its share is second only to silicon wafers. Minsheng Securities pointed out that with the gradual increase in the share of China's semiconductor industry in the world, the size of China's semiconductor mask market is also gradually expanding. Currently, domestic manufacturers are gradually narrowing the technological gap with leading overseas companies. The prosperity of the industry is expected to continue to be strong, and domestic manufacturers are expected to experience rapid growth in performance.
According to the Finance Federation's theme library, among the relevant listed companies:
Qingyi OptoelectronicsCustomer testing, certification and mass production of the 180nm process node semiconductor chip mask version have been achieved, and process development of the 130nm-65nm semiconductor chip mask version and the mask plate process development plan required for 28nm semiconductor chips have been carried out simultaneously.
Guanshi TechnologyThe photomask version project that has been invested in construction is currently in the construction stage. Through the construction of this fund-raising project, the company will have large-scale production capacity for semiconductor photomask versions.