Guanshi Technology said on the interactive platform that the company's photomask manufacturing project is under construction. It is expected that the company will achieve mass production of the 45nm photomask version in 2025 and mass production of the 28nm photomask version in 2028. After all are produced, the annual output of the semiconductor photomask version will exceed 0.0125 million pieces. The products can be widely used in the field of integrated circuits and semiconductors involved in many industries such as high-performance computing, artificial intelligence, mobile communications, smart grids, high-speed rail transit, new energy vehicles, consumer electronics, etc., and can meet the procurement needs of various types of wafer design and foundry companies, as well as the application needs of advanced semiconductor chip packaging and semiconductor devices.