Shengmei Semiconductor Equipment (Shanghai) Co., Ltd. (referred to as "Shengmei Shanghai") announced today that its cleaning equipment product Ultra C Tahoe has achieved an important performance breakthrough. This improvement can meet the stringent technical requirements of more advanced wafer foundries, logic devices, and memory devices. According to Shengmei Shanghai's estimation, the annual cost savings from just sulfuric acid alone can reach up to 0.5 million US dollars, and further cost reduction can be achieved in sulfuric acid wastewater treatment while being more environmentally friendly. Several large wafer foundry customers in mainland China have already put the upgraded Ultra C Tahoe into production. Several other logic device and memory device customers are currently evaluating the equipment, and it is expected that more equipment will be delivered before the end of 2024.
盛美上海前段半导体制造清洗设备Ultra C Tahoe取得重要性能突破
Shengmei Shanghai Front Semiconductor Manufacturing Cleaning Equipment Ultra C Tahoe Achieves Important Performance Breakthrough.
The translation is provided by third-party software.
The above content is for informational or educational purposes only and does not constitute any investment advice related to Futu. Although we strive to ensure the truthfulness, accuracy, and originality of all such content, we cannot guarantee it.