Crystal Clear Electronic Material stated on the interactive platform that the company has a total of 5 lithography machines, which are used for the research and development and mass production of UV broad-spectrum, g-line, i-line, KrF, and ArF products. The R&D work of ArF high-end lithography photoresist is being carried out in an orderly manner, and some samples have been sent to customers for verification.
晶瑞电材：ArF高端光刻胶研发工作在有序开展中
Crystal Clear Electronic Material: R&D of high-end ArF photoresist is being carried out in an orderly manner.
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