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容大感光:面向市场的半导体用光刻胶主要包括g/i线光刻胶 已实现量产销售

Shenzhen Rongda Photosensitive & Technology's market-oriented semiconductor photolithography primarily consists of g/i-line photolithography and has achieved mass production and sales.

Breakings ·  Jun 27 20:57
Shenzhen Rongda Photosensitive & Technology stated during the survey that its currently market-oriented semiconductor photoresist products mainly include g/i-line photoresist, which has realized mass production and sales. The company is also closely monitoring and paying attention to more high-end semiconductor photoresist products. The previous fundraising project was for general-purpose photosensitive dry film, while the current fundraising project includes the construction of high-end photosensitive dry film, which has been validated by some downstream customers and has achieved small-scale supply. It can be used in high-precision markets such as semiconductor lead frames, substrates for semiconductor displays, flexible PCB precision substrates, and high-density substrates for mobile communication.

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