Japanese Mitsui Chemicals announced that it will begin mass production of components for the most advanced lithography machine in the semiconductor industry (the new generation of protective film material "Pellicle" that protects semiconductor circuit originals). It plans to set up a production line at the Otake factory in Yamaguchi Prefecture, Japan, with a planned annual capacity of 5,000 sheets. The production line is expected to be completed in December 2025. It can support the next generation of lithography machines developed by ASML Holding in the Netherlands.
三井化学将量产光刻薄膜新品 支持阿斯麦新机
Mitsui Chemicals will mass-produce a new photomask film to support ASML's new machine.
The translation is provided by third-party software.
The above content is for informational or educational purposes only and does not constitute any investment advice related to Futu. Although we strive to ensure the truthfulness, accuracy, and originality of all such content, we cannot guarantee it.